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New Ultra-High Barrier, Planarizing Thin Film Introduced
Publication Date:29-November-2004
Source: Techni-Met Inc. 
New ultra-high barrier, planarizing thin film products introduced for medical, pharmaceutical, electronics, aerospace & defense, automotive, battery, solar and fuel cells applications for custom-designed, critically demanding performance specifications.

A new ultra-high barrier and planarizing thin film technology for applications requiring superior water, oxygen and optical performance properties surpassing those available in the industry is introduced by Techni-Met Inc. 

Designed for critical, technically-demanding barrier demands in medical, pharmaceutical, electronics, aerospace, automotive, battery, and solar and fuel cells applications, this new vacuum barrier coating technology is produced on a broad range of both flexible plastic substrates 
including PET, PC, PEN, PVC, polyimide and on copper, stainless steel and aluminum foils.

The in-line, roll-to-roll thin film deposition process provides a planarizing, or smoothinglayer with the consistency and uniformity approaching that of a silicon wafer, smoothening substrate surfaces with bumps or depressions of up to .75 microns.

Techn-Met's vacuum-sputtering technology allows thinner, less costly materials to be used in barrier products, eliminating the need for expensive laminations, and delivering exceptional optical clarity as well as high barrier performance. 

The custom-designed, sputtered thin films inhibit deterioration from moisture and corrosion, provide encapsulation and improve electrical and thermal insulating properties. Additionally, the depositions improve surface energy and resist abrasion. As a weatherable protective layer, chemical and fade resistance is enhanced while maintaining the films’ clarity and gloss where required.

Barrier properties on 7 mil PET film:
WVTR at 38 degrees C, 100% RH: English .0019g/100in2/day; S.I. .03g/m2/day
OTR at 23 degrees C, 100% RH: English .015cc/100in2/day; S.I. .23cc/m2/day
Techni-Met thin film depositions are produced on substrate gauges of .25 to 20 mil and widths to 62”. 

The company' advanced thin films offer superior, uniform adhesion meeting customers’ demanding specifications and critical fitness for use requirements. Processed on proprietary, multi-unit magnetron and reactive sputtering systems, Techni-Met states that its manufacturing 
capabilities provide unique coatings and materials properties and produce consistently high quality, uniformity and yield. 

Full R & D, prototype, product development and manufacturing services are provided. ISO-qualified, two Class 7 clean rooms for environmentally-sensitive applications are maintained.
 

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